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KMID : 0371820030350060507
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Nuclear Engineering and Technology
2003 Volume.35 No. 6 p.507 ~ p.514
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A Study on Etching of UO₂, Co, and Mo Surface with R.F. Plasma Using CF₄ and O₂
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Kim Yong-soo
Seo Yong-Dae
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Abstract
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KEYWORD
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decontamination, radwaste, plasma processing
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